The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 1984

Filed:

May. 11, 1982
Applicant:
Inventors:

Peter Vettiger, Langnau a/A, CH;

Alan D Wilson, Mt. Kisco, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N / ; G01D / ; G12B / ;
U.S. Cl.
CPC ...
2502521 ; 2504911 ;
Abstract

An electron beam fabricated mask used in the production of integrated circuits is tested by a method that includes the steps of forming a print of the mask and then inspecting the print by writing the same electron beam pattern or complement thereof on the print and detecting pattern coincidence and non-coincidence with a vector scan system.


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