The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 1984
Filed:
Oct. 14, 1983
Applicant:
Inventor:
Antonius W De Laat, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ; C25D / ;
U.S. Cl.
CPC ...
204-5 ; 204 / ; 204 / ;
Abstract
A method of manufacturing a metal mother matrix in which a master disk, which is a supporting disk, carrying on one side a layer of a positive photoresist in which an information track is provided, is provided with a metal peel, first by electroless deposition and then by electrodeposition, the metal peel is separated from the master disk, the remainders of the photoresist present on the father matrix thus obtained are dissolved and a metal copy, which is a mother matrix, is manufactured by electrodeposition from the father matrix, characterized in that the photoresist is made electrically conductive by means of exposure to light.