The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 1984

Filed:

Jun. 16, 1982
Applicant:
Inventors:

Edward J Saccocio, Columbus, OH (US);

Mark E Holycross, Columbus, OH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-1 ; 134 38 ; 156643 ;
Abstract

Ashing rates of encapsulants exposed to an oxygen plasma in a reactor are increased by simultaneously exposing a solid halogen-substituted hydrocarbon polymer to a plasma jet formed within a cavity in a grounded conductive surface of the reactor. Advantageously the solid reactant may be polyvinyl chloride or polytetrafluorethylene in solid form.


Find Patent Forward Citations

Loading…