The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 1984
Filed:
Aug. 04, 1982
Applicant:
Inventor:
W Derek Buckley, Easton, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ; H01L / ;
U.S. Cl.
CPC ...
378 34 ; 2504911 ; 378205 ;
Abstract
This invention relates to apparatus for effecting alignment and spacing control of a mask and wafer for use, for example, in x-ray lithography, which includes, in combination, two optical channels for effecting lateral and vertical alignment at two spaced alignment targets respectively on the element, two spaced position sensors located on a line which is oblique with respect to a line joining the two alignment targets, and linkage for maintaining the distances between the position sensors and the element equal one to the other.