The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 1984
Filed:
Apr. 25, 1983
Raymond L Chuan, Huntington Beach, CA (US);
Other;
Abstract
Method and apparatus for employing a plasma produced in a radio-frequency discharge to enhance electrostatic precipitation. The plasma is generated in an auxiliary gaseous stream, and the plasma is introduced into a primary fluid stream flowing toward or in an electrostatic precipitation zone. The plasma causes ionization of the auxiliary gaseous stream, and the ionized gaseous stream charges the particles in the primary fluid stream. The primary fluid stream in which the particles are entrained flows in a primary duct toward an electrostatic precipitator containing the precipitation zone. A plasma generator generates plasma in the auxiliary gaseous stream to cause ionization thereof; and a secondary duct conducts the plasma into the primary stream for charging particles in the primary fluid stream. The charged particles then flow in the primary fluid stream into the precipitator.