The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 1984
Filed:
Sep. 08, 1981
Samuel G Williams, Los Angeles, CA (US);
Hughes Aircraft Company, El Segundo, CA (US);
Abstract
A complex optical system may be aligned by means of a technique in which an analytical model of the system is utilized which is assumed to be capable of essentially optimal performance. A physical example of the same system design is then assembled and a plurality of performance characteristics measured. A plurality of specific adjustments are then calculated which would have the effect of degrading the performance of the analytical model to equal that measured for the physical example, whereupon compensating physical adjustments are made to the physical example. For many applications, the performance measurements may relate to aberrations to the wavefront of the point source image quantified by means of a Hartmann mask or the like. In that event, the estimation technique may be a straight-forward linear approximation technique including possible damping and/or weighting factors. The performance measurements may also be related to the intensity function associated with the image of a point source, in which case a second order estimation technique is required.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile