The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 1984
Filed:
Nov. 09, 1983
Tommy L Poteat, Bridgewater, NJ (US);
AT&T Bell Laboratories, Murray Hill, NJ (US);
Abstract
A method for micromachining precise semiconductor features involving a pre-etch for establishing proper mask alignment. In one embodiment, the pre-etch utilizes a mask opening which has at least two edges oriented at a significant angle with the nominal (110) direction of a silicon wafer. The silicon is anisotropically etched through this opening until the true (110) lines are revealed by the intersection of the (111) planes with the wafer surface. Two parallel lines will therefore be formed to provide alignment of the mask for subsequent feature definition. In a further embodiment, the silicon wafer is completely etched through so that a pit edge on the front surface is offset on the back surface by an amount equal to the wafer thickness. This provides front-to-back alignment in subsequent processing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile