The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 1984
Filed:
Dec. 27, 1983
Applicant:
Inventors:
Lawrence K White, Mercer County, NJ (US);
Metodi Popov, Hunterdon County, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156628 ; 156646 ; 156655 ; 1566591 ; 156668 ; 156643 ; 2041 / ; 252 791 ;
Abstract
An improved method of etching a layer of organic material on a sustrate by oxygen plasma or oxygen reactive ion etching is disclosed. The surface of the layer is flood exposed with a plasma including a fluorine species for a time sufficient to significantly reduce the etch rate thereof in the oxygen etch. A patterned mask is then formed on the layer and the exposed portion etched. The subject method produces vertical walls in the etch profile with substantially no rounding of the top edge.