The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 1984

Filed:

Jan. 31, 1983
Applicant:
Inventors:

Wen-Hsuan Chang, Gibsonia, PA (US);

David T McKeough, Gibsonia, PA (US);

John R Peffer, Pittsburgh, PA (US);

Assignee:

PPG Industries, Inc., Pittsburgh, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528 26 ; 528 28 ; 528 29 ; 528 34 ; 524100 ; 524783 ; 524859 ; 556437 ; 556438 ; 556413 ; 556414 ; 556418 ; 556462 ; 556450 ;
Abstract

Disclosed is a resin comprising a reaction product prepared by partially reacting to homogeneity a hydrophobic polyol and an organosilicon-containing material comprising an organosilicon-containing substance. The organosilicon-containing substance has atoms bonded directly to silicon, all of which atoms are selected from oxygen, nitrogen, and/or chlorine, and additionally has moieties directly bonded to silicon which are easily displaceable by reaction with water and/or alcohol. At least a part of the organosilicon-containing substance is hydrolyzed. The reaction product is homogeneous and contains residual hydroxyl moieties from the hydrophobic polyol and residual moieties bonded directly to silicon which are easily displaceable. the reaction product is capable of self-curing, optionally with a catalyst, by reaction with moisture and/or with the residual hydroxyl moieties, of the residual moieties directly bonded to silicon which are easily displaceable.


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