The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 1984
Filed:
May. 20, 1982
Takeshi Yamamoto, Hino, JP;
Kiyoshi Goto, Hino, JP;
Yoshio Kurita, Hino, JP;
Noriyasu Kita, Hino, JP;
Naoshi Kunieda, Hino, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Abstract
A developer composition of an alkaline aqueous solution containing a reducing inorganic salt, typically an alkali metal salt of sulfurous acid such as sodium sulfite, is found to be applicable for development of a lithographic printing plate material containing a photosensitive o-quinonediazide compound and an organic polymer, with reduced deterioration in developing capacity caused by the air and enhanced stability with lapse of time. In particular, a developer composition composed of an alkaline aqueous solution of pH 11 or higher containing a water-soluble sulfurous acid salt is effective for developing both of a lithographic printing plate material having a nega-type photosensitive layer containing a photosensitive diazo compound and an organic polymer, and a lithographic printing plate material having a posi-type photosensitive layer containing an o-quinonediazide compound and an organic polymer.