The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 21, 1984
Filed:
Oct. 11, 1983
Applicant:
Inventor:
Harold E McKelvey, Farmington Hills, MI (US);
Assignee:
Shatterproof Glass Corporation, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
204298 ; 2041 / ; 2041 / ;
Abstract
A magnetron cathode sputtering apparatus including a pair of rotary cylindrical sputtering targets mounted in spaced parallel relation in an evacuable coating chamber and separate magnetic means located within said targets, the magnetic means being oriented relative to one another such that the material sputtered therefrom will be directed inwardly and downwardly at an acute angle whereby the sputtered material from the two targets will be focused upon the substrates.