The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 1984
Filed:
Oct. 31, 1981
Applicant:
Inventors:
Assignee:
Ryo-Nichi Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
526 88 ; 422138 ; 526 67 ; 526202 ; 5263442 ;
Abstract
A batch suspension of vinyl chloride is processed in a reaction zone with external cooling zone wherein the volume ratio of total monomer charge to water is more than 0.8 and dispersing agent is 0.03 to 0.1% based on monomers. Circulation of reaction mixture to cooling zone is initiated after conversion of monomer is at least 20%.
Quick Actions:
Makino, Tetsuya. (1984). Process for the suspension polymerization of vinyl chloride (U.S. Patent No. 4464517). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4464517
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile