The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 1984
Filed:
Apr. 12, 1982
Ryo Imura, Sayama, JP;
Tadashi Ikeda, Kodaira, JP;
Ryo Suzuki, Kodaira, JP;
Nagatugu Koiso, Tama, JP;
Teruaki Takeuchi, Kokubunji, JP;
Hiroshi Umezaki, Mitaka, JP;
Yutaka Sugita, Tokorozawa, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A method of implanting a magnetic garnet film with ions is disclosed in which a covering film is provided on a monocrystalline magnetic garnet film for magnetic bubbles, and hydrogen ions are implanted in a desired portion of a surface region in the magnetic garnet film through the covering film. According to this method, it is possible to form an ion-implanted layer in which the ion concentration distribution in the direction of depth is uniform, and moreover the inplane anisotropy field in the ion-implanted layer decreases only a little with time in an annealing process.