The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 1984
Filed:
Jul. 12, 1982
Addison B Jones, Yorba Linda, CA (US);
Rockwell International Corporation, El Segundo, CA (US);
Abstract
An improvement in the method of forming polymerization resists by directing high energy particles such as electron beams along a path across a vacuum chamber and onto polymerizable molecular species at a substrate surface with sufficient energy to polymerize the polymerizable molecular species in situ is provided, comprising maintaining a chamber-isolated relatively higher pressure layer of polymerizable molecular species vapor locally at the substrate surface during, e.g. electron beam exposure to form the resist while maintaining the beam path free of polymerizable molecular species during beam traverse of the chamber. Polymerization resist generation apparatus is also provided comprising a high energy particle, e.g. electron beam source including an electron beam gun and a vacuum chamber therebeyond, means adapted to support a substrate having a surface on which a resist is to be generated in electron beam exposed relation, means defining a closed volume between the supported substrate and the electron beam source, and means to introduce polymerizable molecular species vapor into the closed volume for electron beam exposure and polymerization in situ on the substrate surface.