The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 1984
Filed:
Oct. 03, 1983
Applicant:
Inventors:
Assignee:
Janome Sewing Machine Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05C / ;
U.S. Cl.
CPC ...
1122661 ; 1121 / ; 112439 ;
Abstract
A method of forming a stitch pattern is disclosed in which at least two closely spaced or coincident end stitches are present. The overall pattern is divided into overlapping block sections. In one block, a first group of stitches is formed followed by a second group of stitches being formed in an adjacent block. The number of stitches between closely spaced or coincident stitches that results is reduced. Therefore the accumulated error of fabric feeding pitches and the distance between the two end stitches is reduced resulting in a more precisely constructed overall pattern.