The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 1984
Filed:
Apr. 05, 1982
Applicant:
Inventor:
Masayoshi Tamai, Kanagawa, JP;
Assignee:
Fuji Xerox Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
156628 ; 156644 ; 156647 ; 156657 ; 156662 ;
Abstract
A method for the formation of a multi-nozzle ink jet is herein disclosed. In this method a single crystal silicon plate is masked and impurities are diffused upon its surface, creating regions of echant resistance. A second single crystal silicon plate is then grown onto the first, and is masked and etched. Due to the unisotropic etching properties of single crystal silicon plates, a groove is formed in the second plate, and a plurality of nozzles is formed in the first plate. This process yields a multi-nozzle ink jet of greater overall strength and utility, while eliminating the waste due to etching run common in the manufacture of conventional ink jets.