The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1984
Filed:
Apr. 20, 1982
Applicant:
Inventors:
Takashi Yamadera, Hitachi, JP;
Nobuyuki Hayashi, Hitachi, JP;
Assignee:
Hitachi Chemical Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430281 ; 430910 ; 430925 ; 20415916 ; 20415918 ;
Abstract
A photosensitive resin composition comprising (a) a polymer obtained by using an aliphatic amino group-containing monomer as a comonomer, (b) an ethylenic unsaturated compound, (c) a photosensitizer and/or a photosensitizer system and (d) an organic halogen compound shows high photosensitivity and excellent resistance to plating and is usable as plating resists or etching resists.