The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1984
Filed:
Jan. 19, 1983
Phillip D Blais, Washington Township, Fayette County, PA (US);
Westinghouse Electric Corp., Pittsburgh, PA (US);
Abstract
A lithographic process utilizing soft x-rays or ions to achieve high resolution is disclosed. The process is particularly useful and semiconductor processing where high resolution is required to achieve a high density. The process utilizes a mask to selectively expose a photoresist to soft x-rays of flood beams of ions. The mask comprises a thin metallic foil supported by a frame such that the foil is in tension. The frame includes optical alignment keys. A second patterned layer of metal is affixed to the foil to form areas which are non-transparent to the soft x-rays or flood ion beams for delineating the elements of a semiconductor circuit, for example. This permits the mask to be optically aligned using conventionally techniques with high resolution being achieved due to the short wavelength of the x-ray radiation or the ion beams.