The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1984
Filed:
Jan. 03, 1983
Applicant:
Inventor:
Peter G Bischoff, Cupertino, CA (US);
Assignee:
Memorex Corporation, Santa Clara, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C25F / ; C25F / ;
U.S. Cl.
CPC ...
20412965 ; 156643 ; 156650 ; 156651 ; 156652 ; 156656 ; 156657 ; 204 15 ; 2041294 ; 2041 / ; 2041 / ; 360122 ; 360126 ;
Abstract
A method for fabricating a metallic pattern on a substrate is disclosed. The method consists of depositing an adhesive and/or plating base material on a substrate upon which a narrow self-supporting border of photoresist is applied. An anodic layer is then deposited and the photoresist removed. The adhesive and plating base material is etched in those areas previously covered by the photoresist and fresh photoresist applied to encapsulate those areas of the anodic layer which form the final pattern of interest. The unwanted anodic material is then etched and the photoresist removed.