The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1984
Filed:
Feb. 24, 1983
Juergen L Pohlmann, Alexandria, VA (US);
The United States of America as represented by the Secretary of the Army, Washington, DC (US);
Abstract
A ternary or more complex semiconductor alloy is treated to form simultansly a junction beneath its surface and to passivate the same surface. The treatment consists of connecting the semiconductor to one electrode of an electrolytic circuit, immersing it in an electrolyte which may contain a leachant, and energizing between electrolytic circuit electrodes with a substantially square electric current wave with a direct current average value. After a predetermined time, the semiconductor is removed from the electrolyte, is disconnected from the electrolyte, and is washed, rinsed, and dried. During the process the electric current causes ions of the semiconductor to migrate toward its surface, where they enter the electrolyte. This depletion of ions effectively forms a junction; the current also causes oxidation of the semiconductor surface for passivation.