The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 1984
Filed:
Feb. 04, 1982
Marion Marsh, New York, NY (US);
Scholl, Inc., Memphis, TN (US);
Abstract
A sandal is provided with an inside arch and ankle stabilizing flange which forms an integral part of a one-piece molded bottom without a separate inner sole. The flange is smoothly curved and extends upward along the arch side for a longitudinal length from a point adjacent the side of the ankle stabilizes the ankle joint by preventing it from rolling inward toward the walking surface thereby providing an unusually high degree of security for an open shoe. The footbed of the molded bottom conforms to the plantar surface of the normal foot while walking or at rest. Both the bottom footbed and the upper pattern including the inner longitudinal arch flange are designed to allow for the anatomical and functional differences between the inside and outside longitudinal arch areas of the normal foot, and act to discourage the tipping of the ankle toward the inside of the foot, resulting in pronation. Also, a pair of support straps are positioned to extend from the inside arch and ankle stabilizing flange in a V-pattern to a small outside flange on the opposite side of the molded bottom and back to a point forward of and below the inside stabilizing flange near the front of the shoe, thereby properly positioning the foot and assuring a stabilizing fit.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile