The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 1984
Filed:
Mar. 03, 1983
Alan D Rousseau, St. Paul, MN (US);
Laurence W Reilly, Jr, St. Paul, MN (US);
Minnesota Mining and Manufacturing Company, St. Paul, MN (US);
Abstract
A photocurable, ethylenically-unsaturated, water-soluble oligomer comprising the reaction product of 100 parts by weight of a dextrin compound, and 35 to 70 parts by weight of at least one ethylenically-unsaturated monomer capable of reacting with at least one hydroxyl group of the dextrin compound, the oligomer having an average in the range of 0.1 to 0.7 ethylenically-unsaturated moiety per anhydroglucose unit and an equivalent weight of 440 to 990, and at least 75 weight percent of the oligomer is water soluble at 20.degree. C. in a concentration of at least 2.5 percent by weight. The oligomer when photocured in combination with an ethylenically-unsaturated monomer is useful as a photoresist in positive-acting, water-developable, lithographic printing plates.