The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 22, 1984

Filed:

Oct. 02, 1981
Applicant:
Inventors:

Tae M Kwon, Thousand Oaks, CA (US);

William P Debley, Sepulveda, CA (US);

Assignee:

Litton Systems, Inc., Beverly Hills, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R / ;
U.S. Cl.
CPC ...
324304 ; 324300 ;
Abstract

There is disclosed a magnetic alignment device and method for its fabrication in which the aligned magnetic moments of a gas enclosed within a container have an increased relaxation time, hence an increase signal to noise output. One embodiment is a nuclear magnetic resonance gyroscope including a container for gas having a layer of rubidium hydride on its inner surface. Enclosed within the container is rubidium vapor and xenon-131 gas. The layer of rubidium hydride is manufactured by reacting hydrogen gas and rubidium at a temperature between approximately 70.degree. and about 250.degree. C. In one specific method, a layer of rubidium hydride is formed by heating rubidium and hydrogen gas at about 85.degree. for about 7 days.


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