The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 22, 1984
Filed:
Sep. 22, 1982
Applicant:
Inventor:
George O Reynolds, Waban, MA (US);
Assignee:
Honeywell Inc., Minneapolis, MN (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B23K / ;
U.S. Cl.
CPC ...
2504921 ; 2191 / ;
Abstract
A high resolution optical lithographic system for exposing 0.25 microns to 0.5 microns linewidths on integrated circuit substrates. The system comprises a deep ultra-violet (UV) source of illumination in conjunction with an optical condenser system and high reduction ratio optical projection system and a deep UV sensitive photoresist. A three-slit interferometric sensor may be used to provide the resolution required to automatically focus the system.
Reynolds, George. (1984). Optical lithographic system (U.S. Patent No. 4450358). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4450358
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile