The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 1984
Filed:
Apr. 29, 1983
Applicant:
Inventors:
Tadaji Fukuda, Kawasaki, JP;
Yuji Nishigaki, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
427 39 ; 427 531 ; 427 541 ; 427 55 ; 427 36 ; 427 86 ; 427 87 ; 427 74 ;
Abstract
This invention is a process for forming film of amorphous material on a support. The amorphous material comprises at least either of hydrogen atom or halogen atom and at least either of silicon atom or germanium atom as a matrix. The film is formed by utilizing a discharge of direct current or low frequency alternating current and, particularly, is radiated with an electromagnetic wave which sensitizes the said amorphous material.