The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 15, 1984
Filed:
Feb. 04, 1983
Applicant:
Inventors:
Hendrik K Kuiken, Eindhoven, NL;
Rudolf P Tijburg, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; C23F / ; B44C / ; C03C / ;
U.S. Cl.
CPC ...
156637 ; 156345 ; 156644 ; 1566591 ; 156647 ; 156664 ;
Abstract
Deep cavities and apertures can be obtained with little undercutting (great etching factor) by etching in an artificial gravitational field (under the influence of centrifugal or centripetal forces).
Kuiken, Hendrik. (1984). Method of etching cavities and apertures in substrates and device for (U.S. Patent No. 4448635). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4448635
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile