The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 15, 1984

Filed:

Nov. 29, 1982
Applicant:
Inventor:

Alexander J Shuskus, West Hartford, CT (US);

Assignee:

United Technologies Corporation, Hartford, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ; C30B / ;
U.S. Cl.
CPC ...
156610 ; 156D / ; 156D / ; 427 39 ; 427 87 ;
Abstract

Type III-V compound semiconductor surfaces are passivated by exposure to a low pressure nitrogen plasma. The III element forms III element-nitride. Nitridation is performed in two steps; the first being at a low temperature to prevent decomposition of the surface by loss of V element, and the second step being performed at an elevated temperature at which nitridation proceeds at a faster rate. The resultant articles have a III element-nitride surface layer which protects the articles from environmental degradation while reducing the surface state density and permitting inversion of the surface layer.


Find Patent Forward Citations

Shuskus, Alexander. (1984). Passivation of iii-v semiconductor surfaces by plasma nitridation (U.S. Patent No. 4448633). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4448633

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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