The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 1984
Filed:
Jun. 21, 1982
Applicant:
Inventors:
Jon Candelaria, Mesa, AZ (US);
Kurt S Heidinger, Santa Clara, CA (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
428428 ; 357 54 ; 427 39 ; 427 93 ; 428432 ;
Abstract
When multilayer-metal electronic devices are heated, voids can form in the metal layers. Void formation is avoided by using a double dielectric layer as the interlayer dielectric. The double layer has a first oxide layer portion in contact with the first metal which is formed by plasma assisted chemical vapor deposition, and a second oxide layer portion formed by other means. The plasma formed oxide layer portion is believed to be in compressive stress relative to the substrate.