The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 01, 1984

Filed:

Jun. 07, 1982
Applicant:
Inventor:

Henry J Emmel, Rochester, NY (US);

Assignee:

Bausch & Lomb Incorporated, Rochester, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350530 ; 7466 / ; 74479 ; 350531 ;
Abstract

A monoaxial adjusting system is provided for accomplishing both coarse and fine focusing adjustments between the nosepiece and stage of a microscope. The coarse adjustment is made by rotation of either of two coarse adjusting knobs which in turn directly rotates a coarse adjusting shaft and cam. Suitable linkage is connected to the cam to affect linear movement between the nosepiece and stage. Fine adjustment is made through rotation of either of two fine adjusting knobs which actuate the coarse shaft and cam through a planetary gear reduction system and follower. A further adjusting mechanism is lever operated so that the operator may easily provide fine adjustment while manipulating the North-South stage and East-West slide control knobs. The entire adjusting system is spring and gravity loaded to eliminate backlash.


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