The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 1984
Filed:
Jun. 01, 1982
Applicant:
Inventors:
Yoshimi Fujita, Tokyo, JP;
Toshiharu Yamashita, Tokyo, JP;
Assignee:
Hoya Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156628 ; 156643 ; 156644 ; 156654 ; 156663 ; 2504921 ; 430321 ;
Abstract
A method for irradiating a chemically machinable light-sensitive glass plate with a parallel bundle of ultraviolet rays so as to form tapered holes or slits in the glass plate. A mask having a desired shaped opening is mounted on the light-sensitive glass plate and the plate is disposed so that its surface forms a predetermined angle with a plane which is perpendicular to the parallel bundle of ultraviolet rays. The glass plate is then rotated about a central vertical axis thereof.