The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 1984

Filed:

Aug. 08, 1983
Applicant:
Inventors:

Kimio Shibayama, Sendai, JP;

Kingo Itaya, Tagajyo, JP;

Teruo Fujimoto, Nagaoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430323 ; 430286 ; 430287 ; 430313 ; 20415922 ;
Abstract

A pattern formation with a negative type resist comprises forming a thin film made of a resist on a board and irradiating light or radiation; developing and etching the product. The resist is a diene polymer obtained by a living polymerization in the presence of an organometallic compound or a cyclic polymer thereof.


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