The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 1984

Filed:

Oct. 23, 1980
Applicant:
Inventors:

Walter Kunz, Oberwil, CH;

Wolfgang Eckhardt, Lorrach, DE;

Adolf Hubele, Magden, CH;

Peter Riebli, Basel, CH;

Assignee:

Ciba-Geigy Corporation, Ardsley, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A01N / ; C07C / ; C07C / ;
U.S. Cl.
CPC ...
4242 / ; 2604 / ; 2605 / ; 424469 ; 4242 / ; 424285 ; 424300 ; 424309 ; 424319 ; 548262 ; 548336 ; 548341 ; 548378 ; 549487 ; 560 10 ; 560 12 ; 560 13 ; 560 14 ; 560 16 ; 560 21 ; 560 22 ; 560 31 ; 560 32 ; 560 43 ; 560163 ; 562426 ; 562427 ; 562430 ; 562433 ; 562435 ; 562437 ; 562455 ; 562456 ;
Abstract

There are described novel homoserine derivatives of the formula (I) ##STR1## which possess valuable microbicidal properties. In the formula: Ar is substituted phenyl or naphthyl; R.sub.1 is C.sub.2 -C.sub.6 alkyl optionally interrupted by oxygen or sulfur, 2-furyl, 2-tetrahydrofuryl, 1H-1,2,4-triazolylmethyl, 1-imidazolylmethyl, 1-pyrazolylmethyl, C.sub.2 -C.sub.4 alkenyl or cyclopropyl, each of which is optionally substituted by halogen; R.sub.2 is hydrogen or methyl; R.sub.3 is hydrogen or C.sub.1 -C.sub.4 alkyl; and B is halogen or an ester, thioester, sulfonic acid ester or sulfonic acid amide group. Additionally, where B is halogen, R.sub.1 may be halomethyl. The novel derivatives can be used for combating microorganisms harmful to plants, particularly for combating phytopathogenic fungi, and they have for practical requirements a very favorable curative and protective action for protecting cultivating plants, without the plants being impaired as a result of undesirable secondary effects. A notable feature is their stability to heat and to solar irradiation. They can be used in practice on their own or in the form of pesticidal compositions.


Find Patent Forward Citations

Loading…