The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 1984
Filed:
Feb. 09, 1982
Alexander Ohorodnik, Erftstadt, DE;
Hans W Keuper, Cologne, DE;
Horst Semmler, Bruhl, DE;
Joachim Hardel, Bruhl, DE;
Hermann Vierling, Hurth, DE;
Robert Willms, Knapsack, DE;
Hoechst Aktiengesellschaft, , DE;
Abstract
The disclosure relates to a process for making fine particulate, non-agglomerating chloropolyethylene by subjecting pulverulent polyethylene to a chlorination reaction in aqueous or aqueous/hydrochloric acid-suspension with chlorine gas at a temperature of about 20.degree. to 140.degree. C. in the presence of silicic acid and silicon oil, separating, washing and drying the chloropolyethylene. More particularly, the disclosure provides for the chlorination to be terminated and for the aqueous hydrochloric acid-suspension of chloropolyethylene to be then intensively mixed with an aqueous or aqueous/hydrochloric acid-dispersion having talc as well as an orthophosphoric acid mono- and/or diester or a polysiloxane by means of an emulsifier dispersed in it, and for the chloropolyethylene to be separated from the mixture, to be washed and dried.