The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 1984
Filed:
Jun. 14, 1982
International Telephone and Telegraph Corporation, New York, NY (US);
Abstract
Hydroxyl free deposition with high efficiency and at a high deposition rate may be achieved, even with use of relatively inexpensive raw materials, by utilizing a ring-shaped plasma activated axial chemical vapor deposition obtaining 100% chemical conversion and fractional volatilization of impurities. The plasma is induced in an annular stream of a plasma-forming gaseous medium, and the reactant or reactants used in the axial chemical vapor deposition are introduced into the center of the ring-shaped plasma to be converted by the heat of the plasma flame into soot which is deposited on a bait. An annular stream of a cooling medium flows outwardly past the plasma flame and is circumferentially centered by an extension of the outer tubular element of a plasma torch in which the plasma is generated. An RF generator which induces the plasma is operated at a frequency exceeding 20 MHz to give the plasma flame the desired ring-sloped configuration.