The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 1984
Filed:
Mar. 02, 1983
Applicant:
Inventor:
Ryozo Hiraga, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 86 ; 355 95 ;
Abstract
In an apparatus for printing a mask pattern on a wafer for manufacturing a semiconductor circuit element, the exposure of the mask pattern is effected by being divided into a plurality of times. Each time the divided exposure is effected, the relative positional relation of the mask pattern and the wafer is made to differ by a minute amount. Thereby, a mask pattern thinner than the line width of the mask pattern is formed on the wafer.