The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 1984
Filed:
Apr. 01, 1983
Applicant:
Inventor:
Alan K Chu, Granada Hills, CA (US);
Assignee:
Atlantic Richfield Company, Los Angeles, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; B05D / ;
U.S. Cl.
CPC ...
427123 ; 429 44 ; 429223 ; 2042 / ; 427352 ; 427423 ; 502101 ;
Abstract
A method for making a Raney nickel electrode without employing a pressure compacting step comprising providing a substrate, coating the substrate with a Raney nickel-aluminum alloy using a plasma deposition technique, and thereafter leaching at least part of the aluminum out of the Raney alloy coating to provide a porous electrode body.
Chu, Alan. (1984). Raney nickel electrode for ni-h.sub.2 cell (U.S. Patent No. 4439466). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4439466
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile