The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 1984
Filed:
Aug. 08, 1983
Jimmie L Powell, Wappingers Falls, NY (US);
Charles L Standley, Hopewell Junction, NY (US);
John Suierveld, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process is disclosed for etching openings in a relatively thick layer of borosilicate glass while controlling the degree of taper of the sidewalls of the opening, the taper being in excess of about 45.degree.. The process involves (1) depositing a layer of silicon nitride that contains silicon in an amount in excess of stoichoimetric in Si.sub.3 N.sub.4, (2) densifying the silicon nitride layer, (3) depositing a layer of resist, (4) exposing and developing the layer of resist to define a desired pattern of openings in the borosilicate glass layer, (5) removing the exposed silicon nitride areas, and (6) subjecting the resultant exposed borosilicate glass surface to an etchant for the glass.