The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 1984
Filed:
Jul. 17, 1981
Rodney C Alferness, Holmdel, NJ (US);
Lawrence L Buhl, New Monmouth, NJ (US);
Janet L Jackel, Holmdel, NJ (US);
Susan P Lyman, Matawan, NJ (US);
Vellayan Ramaswamy, Lincroft, NJ (US);
Bell Telephone Laboratories, Incorporated, Murray Hill, NJ (US);
Abstract
A simple, inexpensive, and reliable technique for substantially preventing the unwanted formation of a surface guiding layer during manufacture of light-guiding structures in LiNbO.sub.3 and LiTaO.sub.3 substrates is disclosed. The technique involves addition of an effective amount of a gaseous hydrogen donor to the processing atmosphere during high-temperature processing. A particularly convenient hydrogen donor is water vapor, which can be added to the atmosphere by, for instance, bubbling of the feed gas through a water column. A partial pressure of more than about 9 Torr of H.sub.2 O has been found effective in the practice of the technique.