The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 1984
Filed:
Jan. 25, 1982
Applicant:
Inventor:
Chung P Wu, Mercerville, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B23K / ;
U.S. Cl.
CPC ...
148-15 ; 2957 / ; 148187 ; 2191 / ; 357 91 ; 427 531 ;
Abstract
A beam of electromagnetic radiation such as a pulsed laser beam is used to anneal materials, such as semiconductor materials, without the formation of puddles. Puddles are caused by raising the temperature of the material to its melting temperature by a laser beam. The beam of the pulsed laser can be scanned over the surface of the semiconductor material without raising the temperature to the melting temperature and with at least about 50% overlap of each irradiated surface portion whereby extensive surface areas can be annealed rapidly without puddling.