The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 1984
Filed:
Jan. 22, 1982
Applicant:
Inventors:
Nobuhiko Terui, Tokyo, JP;
Kenichi Magariyama, Tokyo, JP;
Assignee:
Nippon Kogaku K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
354442 ; 354412 ;
Abstract
Aperture-priority, shutter-priority, and programmed automatic exposure modes may be selected, with or without automatic focus control. For certain types of operation, the diaphragm value of a photographic lens is set to a value between maximum and minimum diaphragm values in response to measurement of the luminance value of an object, and when the set diaphragm value is smaller than a predetermined diaphragm value at which the lens has a predetermined depth of focus, the diaphragm is adjusted to the predetermined diaphragm value, and the shutter time (speed) is adjusted accordingly to provide a proper exposure.