The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 1984
Filed:
Jul. 13, 1981
John R Osborne, Saratoga, CA (US);
Peter G Bischoff, Cupertino, CA (US);
Memorex Corporation, Santa Clara, CA (US);
Abstract
A method is disclosed for precisely aligning the pole tips of a thin film magnetic head. Two separate metallic layers, such as Permalloy (Ni-Fe alloy) are separated by a layer of insulating material such as silicon dioxide or AL.sub.2 O.sub.3 which will serve as the insulative spacer of the final magnetic head. A photo-resist is applied to the surface of the top metallic layer in an imagewise configuration to establish the shape of the top pole. The top pole is then etched and the photo-resist removed. The top electrode is then encapsulated with a protective metal and is used as a mask during the chemical etching of the insulative layer, the bottom electrode being used as an etch stop. This integral structure is then used as a mask during the chemical etching of the bottom electrode, resulting in pole tips which are precisely aligned.