The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 1984
Filed:
Dec. 21, 1981
Masami Emoto, Kanagawa, JP;
Ricoh Company, Ltd., , JP;
Abstract
A photosensitive member is subject to a slitwise exposure. An imaging lens system is displaced in accordance with the magnitude of a magnification being utilized during a copying process which is switched. Disposed adjacent to the end face of a lens in the imaging lens system is at least one rectangular light shield member so that its lengthwise dimension corresponds to a slitwise scan direction. The light shield member is movable into or out of a light flux which is utilized for purpose of exposure, and is integral with the imaging lens system as the latter is displaced in accordance with a magnification being utilized during a particular copying process. During a light shielding operation, the light shield member is adapted to be disposed within or wedged partly into the light flux of exposure. As the copying magnification is switched, the amount of exposure light which is cut off by the light shield member changes, whereby the distribution of exposure light in the slit-shaped exposure station is made uniform as viewed lengthwise of the exposure station.