The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1984
Filed:
Sep. 16, 1981
Masahiro Kazahaya, Southampton, PA (US);
Fischer & Porter Company, Warminster, PA (US);
Abstract
An auxiliary channel coupled to a selected loop in a plurality of process control loops included in a direct digital control system, the channel serving to expand the frequency response of the selected loop. The system is provided with a digital computer acting as an electronic controller common to all loops, each loop including a transducer sensing a particular process variable to produce a corresponding analog input signal which is digitized and compared in the computer with a set point signal to yield, after conversion, an analog output signal for operating a final control element in the loop to correct for process variations. The analog input signals from the respective loops are sequentially fed into the computer through a multiplexer at a relatively slow sampling rate whereby the loops are normally responsive only to the low-frequency component in the sampled process variables representing slow changes. The input signal from the selected loop is also fed into the auxiliary channel which includes a filter that passes the high-frequency component in the process variable to an amplifier whose output and the output signal from the selected loop are applied to an adder to produce a composite output signal for operating the final control element in a manner rendering the selected loop responsive to the full range of slow and rapid process variations.