The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 28, 1984
Filed:
Apr. 16, 1982
Don W Caudy, Sunbury, OH (US);
Donald J Hackman, Columbus, OH (US);
John R Myers, Columbus, OH (US);
Robert T Hoffman, Kailua, HI (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
A controlled gas generator system is provided which has a reaction chamber, he reaction chamber having top and bottom ends. A bed of reactant material is disposed within the chamber intermediate its top and bottom ends. Liquids are located within the chamber, one of the liquids being nonreactive with the reactant. The liquids are dissimilar in specific gravity so that the liquids interface substantially along a cross-sectional plane of the chamber. With this arrangement, gas will be produced when the interfacial plane is vertically disposed on one side of the bed of reactant material, and gas will not be produced when the interfacial plane is vertically disposed on an opposite side of the bed of reactant material. Provision is made for selectively adjusting the vertical position of the interfacial plane above or below the bed of reactant material so that gas can be selectively generated.