The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 21, 1984
Filed:
Feb. 26, 1982
Haruo Okamoto, Niigata, JP;
Motoyuki Yamada, Niigata, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The invention provides a novel method for manufacturing fused quartz glass by the decomposition and oxidation of a vaporizable silicon compound such as silicon tetrachloride in a plasma flame according to which the quartz glass rod produced contains a controlled amount of hydroxy groups with high reproducibility. The principle of the inventive method consists in the admixture of gaseous hydrogen chloride into the gaseous reactant mixture or in the plasma-supporting gas as the source for the hydrogen atoms to be converted to the hydroxy groups in place of hydrogen gas or water vapor as the hydrogen source. Good proportionality is established between the concentration of the hydrogen chloride in the gaseous feed and the hydroxy content in the resultant fused quartz glass rod.