The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 1984
Filed:
Sep. 01, 1981
Applicant:
Inventors:
Alan R Reinberg, Westport, CT (US);
George N Steinberg, Westport, CT (US);
Charles B Zarowin, Rowayton, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; B01K / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2191 / ; 156646 ; 204164 ;
Abstract
Apparatus for plasma etching of semiconductor devices. A plasma chamber is inductively coupled to a source of A.C. power wherein the semiconductor devices are etched. Alternately, the semiconductor devices may be etched or stripped at a location downstream of the plasma chamber.