The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 07, 1984
Filed:
Apr. 26, 1982
Applicant:
Inventors:
Akira Hosoya, Hitachi, JP;
Kunihiro Tamahashi, Hitachi, JP;
Shigeharu Onuma, Hitachi, JP;
Atsushi Kakuta, Hitachiota, JP;
Yasuki Mori, Hitachi, JP;
Katsuhito Suzuki, Mito, JP;
Hirosada Morishita, Hitachi, JP;
Assignees:
Hitachi, Ltd., Tokyo, JP;
Hitachi Koki Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430 58 ; 430 66 ; 430 67 ; 430961 ;
Abstract
An electrophotographic photosensitive material having a long lifetime can be provided by forming an amorphous silicon layer having a thickness of 0.01-0.08 .mu.m on the photoconductive layer on the electrically conductive substrate in the said material without changing the characteristics of the photoconductive layer.