The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 07, 1984

Filed:

Dec. 08, 1981
Applicant:
Inventors:

Gerhard Ranke, Pocking, DE;

Horst Weiss, Munich, DE;

Assignee:

Linde Aktiengesellschaft, Wiesbaden, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ; B01J / ;
U.S. Cl.
CPC ...
4235 / ; 423226 ; 55 68 ; 55 73 ; 422169 ; 422189 ;
Abstract

In a system for the separation of sour gases especially hydrogen sulfide and carbon dioxide from a raw gaseous mixture e.g., hydrogen-containing in order to form a purified gaseous mixture, comprising scrubbing the gaseous mixture in a first scrubbing stage with a physical scrubbing liquid e.g., methanol having a higher absorbability for hydrogen sulfide than for carbon dioxide, withdrawing from the scrubbing stage a first stream of scrubbing liquid loaded with hydrogen sulfide and carbon dioxide, and regenerating the loaded scrubbing liquid to form (a) a gaseous phase containing hydrogen sulfide, and (b) regenerated scrubbing liquid, the improvement of scrubbing said gaseous phase containing hydrogen sulfide in a second scrubbing stage with a stream of scrubbing liquid capable of absorbing additional H.sub.2 S, e.g., a CO.sub.2 -depleted stream from an H.sub.2 S enrichment column; and subjecting resultant second stream of scrubbing liquid loaded with hydrogen sulfide to a separation stage, preferably rectification, to form a bottoms of regenerated scrubbing liquid and an overhead of a gaseous phase rich in hydrogen sulfide irrespective of whether the raw gaseous mixture has a very low H.sub.2 S concentration.


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