The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 31, 1984
Filed:
Apr. 04, 1983
Applicant:
Inventor:
William D Sproul, Palatine, IL (US);
Assignee:
Borg-Warner Corporation, Chicago, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 204298 ;
Abstract
A method of reactive sputtering of the nitride, oxide or carbide of titanium or similar materials onto a substrate from a target of the pure metal in a chamber utilizing an inert gas, such as argon, wherein the deposition rate of the metallic compound approaches substantially the deposition rate of the pure metal. A reactive gas is introduced into the chamber adjacent to the target at a constant flow and by a rapid pulsing wherein a valve is alternately opened and shut for very short time intervals.