The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 1984

Filed:

Jun. 01, 1982
Applicant:
Inventors:

Hans de Vries, Heerde, NL;

Siegfried Birkle, Hochstadt, DE;

Klaus Stoeger, Nuremberg, DE;

Johann Gehring, Spardorf, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
204201 ; 204275 ;
Abstract

A device for continuously processing an article such as by electroplating including a tank equipped with a horizontally disposed rotating electroplating drum, an entry station disposed for introducing an article to one end of the drum and an exit station for removing the processed article from the drum. The electroplating tank as well as the entrance and exit stations are provided with gas-tight seals so that the device may be utilized for an oxygen-free and water-free aluminum-organic electrolyte for the electrodeposition of aluminum. Preferably, the entrance and exit stations contain liquid locks to prevent the controlled atmosphere above the electrolyte from being contaminated.


Find Patent Forward Citations

de Vries, Hans. (1984). Electroplating device (U.S. Patent No. 4427518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4427518

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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